Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon: Difference between revisions

Revision as of 15:25, 28 November 2012 view source Mdyma (talk \| contribs) danchip 584 edits →LPCVD (Low Pressure Chemical Vapor Deposition) PolySilicon ← Older edit		Revision as of 15:25, 28 November 2012 view source Mdyma (talk \| contribs) danchip 584 edits →LPCVD (Low Pressure Chemical Vapor Deposition) PolySilicon Newer edit →
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	'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=86 Furnace: LPCVD Poly 4" (B4)]'''		'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=86 Furnace: LPCVD Poly 4" (B4)]'''

	'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=291 Furnace: LPCVD Poly 6" (B4)]'''		'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=291 Furnace: LPCVD Poly 6" (B4)]'''