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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using LPCVD TEOS: Difference between revisions

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==Process parameters for the two standard deposition recipes on the TEOS furnace:==
==Process parameters for the two standard deposition recipes on the TEOS furnace:==
{| border="2" cellspacing="1" cellpadding="0"  
{| border="0" cellspacing="0" cellpadding="0"  
!Recipe name
!Recipe name
!Wafer size and number of wafers
!Wafer size and number of wafers
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