Specific Process Knowledge/Thermal Process/Furnace Noble: Difference between revisions

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 ==Overview of the performance of the Noble Furnace==
-{| border="2" cellspacing="0" cellpadding="10"
+{| border="2" cellspacing="0" cellpadding="0"
 |-
-!style="background:silver; color:black;" align="left"|Purpose
+!style="background:silver; color:black;" align="center"|Purpose
 |style="background:LightGrey; color:black"|Oxide growth, annealing
 |style="background:WhiteSmoke; color:black"|
 |-
-!style="background:silver; color:black" align="left"|Performance
+!style="background:silver; color:black" align="center"|Performance
 |style="background:LightGrey; color:black"|
 |style="background:WhiteSmoke; color:black"|
 *
 |-
-!style="background:silver; color:black" align="left" valign="top" rowspan="3"|Process parameter range
+!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameter range
 |style="background:LightGrey; color:black"|Process Temperature
 |style="background:WhiteSmoke; color:black"|
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 |style="background:LightGrey; color:black"|Gasses on the system
 |style="background:WhiteSmoke; color:black"|
-*
+*N<sub>2</sub>:0-5 sccm
+*O<sub>2</sub>: 0-5 sccm
 |-
 !style="background:silver; color:black" align="left" valign="top" rowspan="2"|Substrates
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 |style="background:WhiteSmoke; color:black"|
 *Silicon wafers (new from the box or RCA cleaned)
+*Contact [mailto:furnace@danchip.dtu.dk furnace@danchip.dtu.dk] before annealing or oxidising metals in the furnace
 |-
 |}