Specific Process Knowledge/Thermal Process/A4 Phosphor Pre-dep furnace: Difference between revisions
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==A4 Furnace Phosphor pre-dep== | ==A4 Furnace Phosphor pre-dep== | ||
[[Image:A4. | [[Image:A4.JPG|thumb|300x300px|A4 Phosphorus pre-dep furnace: positioned in cleanroom 2]] | ||
A4 is a furnace to dope Si wafers with Phosphor to make conductive lanes, etch stops etc. The doping source is Phosphoryl chloride (commonly called phosphorus oxychloride) is a colourless liquid with the formula POCl<sub>3</sub>. | A4 is a furnace to dope Si wafers with Phosphor to make conductive lanes, etch stops etc. The doping source is Phosphoryl chloride (commonly called phosphorus oxychloride) is a colourless liquid with the formula POCl<sub>3</sub>. | ||