Specific Process Knowledge/Thermal Process/A3 Phosphor Drive-in furnace: Difference between revisions
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*Dry SiO<sub>2</sub>: 50 Å to ~2000 Å (takes too long to make it thicker) | *Dry SiO<sub>2</sub>: 50 Å to ~2000 Å (takes too long to make it thicker) | ||
*Wet SiO<sub>2</sub>: 50 Å to ~3 µm | *Wet SiO<sub>2</sub>: 50 Å to ~3 µm (takes too long to make it thicker) | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameter range | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameter range | ||