Specific Process Knowledge/Thermal Process/A3 Phosphor Drive-in furnace: Difference between revisions
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==A3 Furnace Phosphorus drive-in== | ==A3 Furnace Phosphorus drive-in== | ||
[[Image:A3helstak.jpg|thumb| | [[Image:A3helstak.jpg|thumb|300x200px|A3 phosphorus drive-in furnace: positioned in cleanroom 2]] | ||
A3 Furnace phosphorus drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide and drive-in of phosphor after a pre-deposition. Phospher pre-deposition takes place in the A4 Furnace phosphorus pre-dep. A3 can also be used for drive in of phosphor which has been ion implanted. | A3 Furnace phosphorus drive-in is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide and drive-in of phosphor after a pre-deposition. Phospher pre-deposition takes place in the A4 Furnace phosphorus pre-dep. A3 can also be used for drive in of phosphor which has been ion implanted. | ||