Specific Process Knowledge/Etch/DRIE-Pegasus/SOIetch: Difference between revisions
Appearance
No edit summary |
No edit summary |
||
| Line 1: | Line 1: | ||
== SOI etch == | |||
The SOI etch uses the Low frequency (LF) platen generator to minimize the notching at buried stop layers such as the BOX layer in a SOI wafer. | |||
{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | {| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | ||
|+ '''SOI etch specifications''' | |+ '''SOI etch specifications''' | ||