Specific Process Knowledge/Thermal Process/Dope with Boron: Difference between revisions
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==Dope with boron== | ==Dope with boron== | ||
The furnace A2 boron predep can be used to pre deposit silicon wafers with boron. The silicon wafers are positioned in a silicon carbide boat just next to wafers of boron nitride. Pre deposit of boron is a diffusion process on the silicon wafers. | The furnace A2 boron predep can be used to pre-deposit silicon wafers with boron. The silicon wafers are positioned in a silicon carbide boat just next to wafers of boron nitride. Pre-deposit of boron is a diffusion process on the silicon wafers. | ||
The concentration of boron in the wafer depends on the process temperature. | The concentration of boron in the wafer depends on the process temperature. | ||