Specific Process Knowledge/Thin film deposition/Deposition of Silicon: Difference between revisions
Appearance
No edit summary |
No edit summary |
||
| Line 7: | Line 7: | ||
! Sputter ([[Specific Process Knowledge/Thin film deposition/Alcatel|Alcatel]]) | ! Sputter ([[Specific Process Knowledge/Thin film deposition/Alcatel|Alcatel]]) | ||
! Sputter([[Specific Process Knowledge/Thin film deposition/Multisource PVD|PVD co-sputter/evaporation]]) | ! Sputter([[Specific Process Knowledge/Thin film deposition/Multisource PVD|PVD co-sputter/evaporation]]) | ||
! Furnace PolySi ([[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|Furnace LPCVD pSi]] | ! Furnace PolySi ([[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon|Furnace LPCVD pSi]]) | ||
! Sputter ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]]) | ! Sputter ([[Specific Process Knowledge/Thin film deposition/Wordentec|Wordentec]]) | ||
|- | |- | ||