Specific Process Knowledge/Wafer cleaning/IMEC: Difference between revisions
| Line 27: | Line 27: | ||
(a yellow and a black spot) | (a yellow and a black spot) | ||
|Clean tank (cleanroom 4, 7-up bath for wafers) and make your own or make in dedicated glass. | |Clean tank (cleanroom 4, 7-up bath for wafers) and make your own or make in dedicated glass. | ||
Pour up H<sub> | Pour up H<sub>2</sub>SO<sub>4</sub> first, put wafers in carrier (USE this in steps 2-7), add H<sub>2</sub>O<sub>2</sub>, wait 30 sec, dip wafers. | ||
|Maybe clean the tank the day before! | |Maybe clean the tank the day before! | ||
|- | |- | ||
| Line 56: | Line 56: | ||
|Piranha | |Piranha | ||
|Not nitride wafers! | |Not nitride wafers! | ||
Mixture: H<sub> | Mixture: H<sub>2</sub>SO<sub>4</sub>:H<sub>2</sub>O<sub>2</sub> (4:1) | ||
Temp: 80 <sup>o</sup>C | Temp: 80 <sup>o</sup>C | ||
Time: 20 min | Time: 20 min | ||