Jump to content

Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions

← Older editNewer edit →
VisualWikitext
BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
Line 363: Line 363:
Sample: Si with 1.4 µm patterned AZ-resist on 50µm pillars
Sample: Si with 1.4 µm patterned AZ-resist on 50µm pillars


Measurement:Film thickness measurements of transparent films on small structure
Measurement: Film thickness measurements of transparent films on small structure


Acceptance criteria:Within ±1% from a standard profiler measurement.
Acceptance criteria: Within ±1% from a standard profiler measurement.




Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Profiler/Optical_Profiler_(Sensofar)_acceptance_test"