Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions

Revision as of 09:23, 17 October 2012 view source BGE (talk \| contribs) Bureaucrats, danchip, Administrators 2,908 edits →Results of acceptance test no. 9 ← Older edit		Revision as of 09:24, 17 October 2012 view source BGE (talk \| contribs) Bureaucrats, danchip, Administrators 2,908 edits →Results of acceptance test no. 10 Newer edit →
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	Measurement:Film thickness measurement of transparent thin film		Measurement:Film thickness measurement of transparent thin film

	Acceptance criteria:SiO2 thickness 28±1 nm		Acceptance criteria: SiO2 thickness 28±1 nm