Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions
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==Results of acceptance test no. 5== | ==Results of acceptance test no. 5== | ||
Sample: Flat sample of silicon with thick patterned oxide. | Sample: Flat sample of silicon with thick patterned oxide (APOX). | ||
Measurement: Step height of patterned thick (10 µm) oxide on top of a silicon wafer.The pattern is aprox. 7µm thick | Measurement: Step height of patterned thick (10 µm) oxide on top of a silicon wafer. The pattern is aprox. 7µm thick. | ||
Acceptance criteria: Step height must be within ±3% of a SEM profile measurement. See the SEM profile here: | Acceptance criteria: Step height must be within ±3% of a SEM profile measurement. See the SEM profile here: | ||
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[[Image:Sensofar_A5_SEM.jpg| | [[Image:Sensofar_A5_SEM.jpg|200x200px|thumb|center|A5]] | ||
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