Specific Process Knowledge/Thermal Process/C1 Furnace Anneal-oxide: Difference between revisions
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|style="background:WhiteSmoke; color:black"|Oxidation: | |style="background:WhiteSmoke; color:black"|Oxidation: | ||
*Dry | *Dry | ||
*Wet: with bubbler (water steam + N< | *Wet: with bubbler (water steam + N<sub>2</sub>) | ||
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!style="background:silver; color:black" align="left"|Performance | !style="background:silver; color:black" align="left"|Performance | ||
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|style="background:LightGrey; color:black"|Gas flows | |style="background:LightGrey; color:black"|Gas flows | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Annealing: N< | *Annealing: N<sub>2</sub>:5 sccm | ||
*Dry oxidation: O< | *Dry oxidation: O<sub>2</sub>:5 sccm | ||
*Wet oxidation: N< | *Wet oxidation: N<sub>2</sub>:5 sccm | ||
|- | |- | ||
!style="background:silver; color:black" align="left" valign="top" rowspan="2"|Substrates | !style="background:silver; color:black" align="left" valign="top" rowspan="2"|Substrates | ||