Specific Process Knowledge/Thermal Process/Annealing: Difference between revisions
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==Annealing== | ==Annealing== | ||
At Danchip we have seven furnaces and an RTP for annealing: A1,A3,C1,C2,C3,C4, noble furnace and RTP. Annealing normally takes place in an N< | At Danchip we have seven furnaces and an RTP for annealing: A1,A3,C1,C2,C3,C4, noble furnace and RTP. Annealing normally takes place in an N<sub>2</sub> atmosphere. PECVD PBSG is annealed in an wet atmosphere which will also oxidize the silicon substrate. | ||
*Anneal with N<math>_2</math> can be done in furnaces:A1,A3,C1,C2,C3,C4, noble furnace and RTP | *Anneal with N<math>_2</math> can be done in furnaces:A1,A3,C1,C2,C3,C4, noble furnace and RTP | ||