Specific Process Knowledge/Characterization: Difference between revisions
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===[[/Profiler|Profiler]]=== | ===[[/Profiler|Profiler]]=== | ||
*[[/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]] | *[[/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]] | ||
*[[/Profiler#Dektak XTA_new stylus profiler|Dektak XTA_new]] | *[[/Profiler#Dektak XTA_new stylus profiler|Dektak XTA_new]] | ||
*[[/Profiler#Dektak _8 stylus _profiler|Dektak 8 stylus profiler]] | |||
===[[/Optical microscope|Optical microscope]]=== | ===[[/Optical microscope|Optical microscope]]=== | ||
Revision as of 14:11, 5 October 2012
Choose topic
- Sample imaging
- Topographic measurement
- Stress measurement
- Measurement of film thickness and optical constants
- Wafer thickness measurement
- Element analysis
- Hydrophobicity measurement
- Resistivity measurement
- Other electrical measurements
Choose equipment
SEM: Scanning Electron Microscopy