Specific Process Knowledge/Characterization/Profiler: Difference between revisions
Appearance
No edit summary |
|||
| Line 120: | Line 120: | ||
==Dektak XTA_new stylus profiler== | ==Dektak XTA_new stylus profiler== | ||
The newer Dektak XTA stylus profiler is usable for profiling surfaces of samples with structures in the micrometer range. | |||
A profil measurement can be done in a specific point by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure in several positions, defined with respect to some deskew points. Stress measurements of thin films can be done by measuring the wafer bow. | |||
==Comparing the profilers== | ==Comparing the profilers== | ||
Take a look at the [[Specific Process Knowledge/Characterization/Topographic measurement|topographic measurement]] page. | Take a look at the [[Specific Process Knowledge/Characterization/Topographic measurement|topographic measurement]] page. | ||