Specific Process Knowledge/Characterization/Optical microscope: Difference between revisions
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! Nikon Eclipse L200 | ! Nikon Eclipse L200 | ||
! Nikon Eclipse L200 (2) | ! Nikon Eclipse L200 (2) | ||
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|[[image:Zeiss Jenatech strain.jpg|175x175px|thumb|left]] | |||
[[image:Zeiss Jenatech strain_1.jpg|175x175px|thumb|left]] | |||
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|[[image:Leica S8 APO.jpg|200x200px|thumb|left]] | |||
|[[image:Zeiss_original_1.jpg|150x150px|thumb|left]] | |||
[[image:Zeiss_original_2.jpg|150x150px|thumb|left]] | |||
|[[image:Leitz Medilux.jpg|200x200px|thumb|left]] | |||
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|[[image:Zeiss Jenatech particle measurement.jpg|175x175px|thumb|left]] | |||
[[image:Zeiss Jenatech particle measurement_1.jpg|175x175px|thumb|left]] | |||
|[[image:Noco IR microscope.jpg|150x150px|thumb|left]] | |||
[[image:Noco IR microscope_1.jpg|150x150px|thumb|left]] | |||
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|'''Location''' | |'''Location''' | ||
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|Yes | |Yes | ||
|No | |No | ||
| | |No | ||
|Yes | |Yes | ||
|No | |No | ||
| | |No | ||
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|'''Episcopic light (reflected light)''' | |'''Episcopic light (reflected light)''' | ||