Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions
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*Incorporation of hydrogen in the film | *Incorporation of hydrogen in the film | ||
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|Batch size | |Batch size | ||
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*Quartz | *Quartz | ||
*Small amount of metal (in PECVD3) | *Small amount of metal (in PECVD3) | ||
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*Silicon | |||
**with layers of silicon oxide or silicon (oxy)nitride | |||
*Quartz | |||
*Metals | |||
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