Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions
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Acceptance criteria: Within ±2% on each layer from an ellipsometer measurement | Acceptance criteria: Within ±2% on each layer from an ellipsometer measurement | ||
'''Settings''' | |||
'''Result''' | |||
*SiO2: 113.1nm | |||
*Si3N4: 136.9nm | |||
==Results of acceptance test no. 12== | ==Results of acceptance test no. 12== | ||