Jump to content

Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions

← Older editNewer edit →
VisualWikitext
BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
Line 325: Line 325:


'''Settings'''
'''Settings'''
Objective: EPI 20x-N
 
*Objective: EPI 20x-N
*Model: SiO2 thermal






'''Result'''
'''Result'''
The result was 28.7nm
The result was 28.7nm


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Profiler/Optical_Profiler_(Sensofar)_acceptance_test"