Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions
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==Results of acceptance test no. 10== | ==Results of acceptance test no. 10== | ||
Sample: Transparent thin film thickness of 28 nm SiO2 on Si | |||
Measurement:Film thickness measurement of transparent thin film | |||
Acceptance criteria:SiO2 thickness 28±1 nm | |||
'''Settings''' | |||
Objective: EPI 20x-N | |||
'''Result''' | |||
The result was 28.7nm | |||
==Results of acceptance test no. 11== | ==Results of acceptance test no. 11== | ||