Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions
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Recipe: Narrow trench | Recipe: Narrow trench | ||
*Operation mode: narrow trench | |||
Operation mode: narrow trench | **Coarse shift single sampling | ||
*Coarse shift single sampling | *Objective: EPI 100X-N | ||
Objective: EPI 100X-N | *Z scan: | ||
**Dual - bottom up | |||
Z scan: | ***top: 4µm | ||
*Dual - bottom up | ***Gap: 20µm (the trench depth) | ||
**top: 4µm | ***Bottom: 4µm | ||
**Gap: 20µm (the trench depth) | *Speed factor: 1x | ||
**Bottom: 4µm | *Threshold: 0.0% | ||
Speed factor: 1x | *Light source: | ||
**Levels: 2 | |||
Threshold: 0.0% | **176 -> 30 (might need to be set a little different) | ||
*Gain: default | |||
Light source: | |||
*Levels: 2 | |||
*176 -> 30 (might need to be set a little different) | |||
Gain: default | |||