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Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions

BGE (talk | contribs)
BGE (talk | contribs)
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Recipe: Narrow trench  
Recipe: Narrow trench  
 
*Operation mode: narrow trench  
Operation mode: narrow trench  
**Coarse shift single sampling
*Coarse shift single sampling
*Objective: EPI 100X-N  
Objective: EPI 100X-N  
*Z scan:  
 
**Dual - bottom up  
Z scan:  
***top: 4µm  
*Dual - bottom up  
***Gap: 20µm (the trench depth)  
**top: 4µm  
***Bottom: 4µm  
**Gap: 20µm (the trench depth)  
*Speed factor: 1x  
**Bottom: 4µm  
*Threshold: 0.0%  
Speed factor: 1x  
*Light source:  
 
**Levels: 2  
Threshold: 0.0%  
**176 -> 30 (might need to be set a little different)  
 
*Gain: default
Light source:  
*Levels: 2  
*176 -> 30 (might need to be set a little different)  
 
Gain: default