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Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions

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Bureaucrats, danchip, Administrators
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Measurement: Step height of patterned thick (10 µm) oxide on top of a silicon wafer.The pattern is aprox. 7µm thick
Measurement: Step height of patterned thick (10 µm) oxide on top of a silicon wafer.The pattern is aprox. 7µm thick
Acceptance criteria: Step height must be within ±3% of a SEM profile measurement. See the SEM profile here:
Acceptance criteria: Step height must be within ±3% of a SEM profile measurement. See the SEM profile here:
{| border="1" cellspacing="1" cellpadding="2"
!
[[Image:Sensofar_A5_SEM.pdf|100x100px|thumb|center|A1]]
|}
See the results here:
{| border="1" cellspacing="1" cellpadding="2"  
{| border="1" cellspacing="1" cellpadding="2"  
!
!
[[Media:Sensofar_A5_50xDI.pdf|100x100px|thumb|center|A1]]
[[Media:Sensofar_A5_50xDI.pdf|100x100px|thumb|center|A1]]
|}
|}
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