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Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions

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{| {{table} border="1"  
{| {{table} border="1"  
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|'''Measured depth'''
| align="center" style="background:#f0f0f0;"|'''Measured depth [nm]'''
|-
|-
| 1||Patterned flat sample of silicon
| 1||337.5
|-
|-
| ||
| 2||336.5
|-
|-
| 2||Patterned flat sample of silicon.
| 3||334.7
|-
|-
| ||
| 4||335.5
|-
|-
| 3||Patterned flat sample of silicon
| 5||339.2
|-
|-
| ||
| 6||337.2
|-
|-
| 4||Patterned flat sample of glass
| 7||334.2
|-
|-
| ||
| 8||335.5
|-
|-
| 5||Flat sample of silicon with thick patterned oxide
| 9||341.1
|-
|-
| ||
| 10||344.4
|-
| 6||Flat sample of silicon with thick layer of patterned polymer
|-
| ||
|-
| 7||Free standing structure
|-
| ||
|-
| ||
|-
| ||
|-
| 8||Stitching of large area
|-
| 9||Narrow trenches and holes
|-
| ||
|-
| 10||Film thickness measurement of transparent thin film
|-
| 11||Measurements of multiple stacks
|-
| 12||Film thickness measurements of transparent films on small structure
|-
| ||
|-
| 13||Roughness repeatability
|-
| ||
|-
|-
|}
|}
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