Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions

@@ Line 112: / Line 112: @@
 Measurement: Depth of pattern
-Acceptance criteria:Depth within ±1% from a standard profiler measurement and repeatability (3 successive measurements) within 0.1%
+Standard profiler measurement:335nm
+Acceptance criteria:Depth within ±1% from a standard profiler measurement (331.65nm-338.35nm) and repeatability (3 successive measurements) within 0.1%
-Standard profiler measurement:
 It was done using interferometric measurements:
@@ Line 124: / Line 126: @@
 It was repeated 10 Time
 The first measurement is shown [[Media:A4_vsi_50xDI_rep_R001.pdf|here]]
+{| {{table} border="1"
+| align="center" style="background:#f0f0f0;"|''''''
+| align="center" style="background:#f0f0f0;"|'''Measured depth'''
+|-
+| 1||Patterned flat sample of silicon
+|-
+| ||
+|-
+| 2||Patterned flat sample of silicon.
+|-
+| ||
+|-
+| 3||Patterned flat sample of silicon
+|-
+| ||
+|-
+| 4||Patterned flat sample of glass
+|-
+| ||
+|-
+| 5||Flat sample of silicon with thick patterned oxide
+|-
+| ||
+|-
+| 6||Flat sample of silicon with thick layer of patterned polymer
+|-
+| ||
+|-
+| 7||Free standing structure
+|-
+| ||
+|-
+| ||
+|-
+| ||
+|-
+| 8||Stitching of large area
+|-
+| 9||Narrow trenches and holes
+|-
+| ||
+|-
+| 10||Film thickness measurement of transparent thin film
+|-
+| 11||Measurements of multiple stacks
+|-
+| 12||Film thickness measurements of transparent films on small structure
+|-
+| ||
+|-
+| 13||Roughness repeatability
+|-
+| ||
+|-
+|}