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Specific Process Knowledge/Characterization/Profiler/Optical Profiler (Sensofar) acceptance test: Difference between revisions

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==Results==
==Results==
===Results of acceptance test no. 1===
===Results of acceptance test no. 1===
Sample material: Patterned silicon substrate
Measurement: Trench depth with aspect ratio 1:10 on a 10 µm wide trench
Acceptance criteria:Depth 100±2 µm
It was done in two ways:
#With confocal objective EPI 100x-N
#With Interferometric objective 50X DI
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