Jump to content

Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon: Difference between revisions

No edit summary
Line 1: Line 1:
==This page has not been made yet - the information is not correct!!==
==LPCVD (Low Pressure Chemical Vapor Deposition) PolySilicon==
==LPCVD (Low Pressure Chemical Vapor Deposition) PolySilicon==
[[Image:A4_Furnace_PolySi.jpg|300x300px|thumb|A4 Furnace PolySilicon (situated in cleanroom 2]]
[[Image:A4_Furnace_PolySi.jpg|300x300px|thumb|A4 Furnace PolySilicon (situated in cleanroom 2]]