Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch: Difference between revisions
| Line 175: | Line 175: | ||
! Etch | ! Etch | ||
! Dep | ! Dep | ||
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!C<sub>4</sub>F<sub>8</sub> (sccm) | !C<sub>4</sub>F<sub>8</sub> (sccm) | ||
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| Line 175: | Line 175: | ||
! Etch | ! Etch | ||
! Dep | ! Dep | ||
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!C<sub>4</sub>F<sub>8</sub> (sccm) | !C<sub>4</sub>F<sub>8</sub> (sccm) | ||
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