Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch: Difference between revisions
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{| border="2" cellspacing=" | {| border="2" cellspacing="2" cellpadding="3" style="text-align:center;" | ||
!Recipe | !Recipe | ||
!nano1.0 | !nano1.0 | ||
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*[[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch nanoetch]] | *[[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch nanoetch]] | ||
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2|Nanoetch contest: DRIE-Pegasus versus ASE (nano1.42 versus pxnano2)]] | *[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2|Nanoetch contest: DRIE-Pegasus versus ASE (nano1.42 versus pxnano2)]] | ||
== Development of switched nanoetch process == | == Development of switched nanoetch process == | ||