Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch: Difference between revisions
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!C<sub>4</sub>F<sub>8</sub> (sccm) | !C<sub>4</sub>F<sub>8</sub> (sccm) | ||
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! colspan="10" align="center"| Zep etch rate (nm/min) | ! colspan="10" align="center"| Zep etch rate (nm/min) | ||
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| | | Averages||.||.||.||.||.||.||.||.||. | ||
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! colspan="10" align="center"| Sidewall angle (degrees) | ! colspan="10" align="center"| Sidewall angle (degrees) | ||