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Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch: Difference between revisions

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{| border="2" cellspacing="1" cellpadding="3" style="text-align:center;"
{| border="2" cellspacing="1" cellpadding="3" style="text-align:center;"
!Recipe
!Recipe
!nano1.0
!
!nano1.1
!
!nano1.2
!
!nano1.3
!
!nano1.21
!
!nano1.4
!
!nano1.41
!
!nano1.42
!
!nano1.43
!
!
|-
|-
!C<sub>4</sub>F<sub>8</sub> (sccm)
!C<sub>4</sub>F<sub>8</sub> (sccm)
|52
|
|52
|
|52
|
|52
|
|75
|
|75
|
|75
|
|75
|
|75
|
|
|-
|-
!SF<sub>6</sub> (sccm)
!SF<sub>6</sub> (sccm)
|38
|
|38
|
|38
|
|38
|
|38
|
|38
|
|38
|
|38
|
|38
|
|-
|-
!O<sub>2</sub> (sccm)
!O<sub>2</sub> (sccm)
|0
|
|0
|
|0
|
|0
|
|0
|
|0
|
|0
|
|0
|
|0
|
|-
|-
! Coil power (W)
! Coil power (W)
|800 (F)
|
|600 (F)
|
|800 (F)
|
|600 (F)
|
|800 (F)
|
|800 (F)
|
|800 (F)
|
|800 (F)
|
|800 (F)
|
|-
|-
!Platen power (W)
!Platen power (W)
|50
|
|50
|
|50
|
|40
|
|50
|
|50
|
|75
|
|40
|
|30
|
|-
|-
! Pressure (mtorr)
! Pressure (mtorr)
|4
|
|4
|
|4
|
|4
|
|4
|
|4
|
|4
|
|4
|
|4
|
|-
|-
! Temperature (degs C)
! Temperature (degs C)
| 10
|
| 10
|
| -10
|
| -10
|
| -10
|
| -20
|
| -20
|
| -20
|
| -20
|
|-
|-
! Process time (s)
! Process time (s)
|120
|
|120
|
|120
|
|120
|
|120
|
|120
|
|120
|
|120
|
|120
|
|-
|-
! colspan="10" align="center"| Etch rates (nm/min)
! colspan="10" align="center"| Etch rates (nm/min)
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch"