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Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch: Difference between revisions

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Line 148: Line 148:
*[[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch nanoetch]]
*[[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch nanoetch]]
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2|Nanoetch contest: DRIE-Pegasus versus ASE (nano1.42 versus pxnano2)]]
*[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2|Nanoetch contest: DRIE-Pegasus versus ASE (nano1.42 versus pxnano2)]]
{| border="2" cellspacing="1" cellpadding="3" style="text-align:center;"
!Recipe
!nano1.0
!nano1.1
!nano1.2
!nano1.3
!nano1.21
!nano1.4
!nano1.41
!nano1.42
!nano1.43
|-
!C<sub>4</sub>F<sub>8</sub> (sccm)
|52
|52
|52
|52
|75
|75
|75
|75
|75
|-
!SF<sub>6</sub> (sccm)
|38
|38
|38
|38
|38
|38
|38
|38
|38
|-
!O<sub>2</sub> (sccm)
|0
|0
|0
|0
|0
|0
|0
|0
|0
|-
! Coil power (W)
|800 (F)
|600 (F)
|800 (F)
|600 (F)
|800 (F)
|800 (F)
|800 (F)
|800 (F)
|800 (F)
|-
!Platen power (W)
|50
|50
|50
|40
|50
|50
|75
|40
|30
|-
! Pressure (mtorr)
|4
|4
|4
|4
|4
|4
|4
|4
|4
|-
! Temperature (degs C)
| 10
| 10
| -10
| -10
| -10
| -20
| -20
| -20
| -20
|-
! Process time (s)
|120
|120
|120
|120
|120
|120
|120
|120
|120
|-
! colspan="10" align="center"| Etch rates (nm/min)
|-
| Averages||.||.||.||.||.||.||.||.||.
|-
| Std. Dev||.||.||.||.||.||.||.||.||.
|-
! colspan="10" align="center"| Zep etch rate (nm/min)
|-
| || ||.||.||.||.||.||.||.||.||.
|-
! colspan="10" align="center"| Sidewall angle (degrees)
|-
| Averages||.||.||.||.||.||.||.||.||.
|-
| Std. Dev||.||.||.||.||.||.||.||.||.
|-
! colspan="10" align="center"| CD loss (nm pr edge)
|-
| Averages||.||.||.||.||.||.||.||||.
|-
| Std. Dev||.||.||.||.||.||.||.||.||
|-
! colspan="10" align="center"| Bowing (nm)
|-
| Averages||.||.||.||.||.||.||.||.||
|-
| Std. Dev||.||.||.||.||.||.||||.||.
|-
! colspan="10" align="center"| Bottom curvature
|-
| Averages||.||.||.||.||.||.||.||.||.
|-
| Std. Dev||.||.||.||.||.||.||.||.||.
|-
! Images
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano10|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano11|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano13|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano121|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano14|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano141|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano143|Images]]
|-
|}
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