Specific Process Knowledge/Characterization/Profiler: Difference between revisions
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The main purpose is 3D topographic imaging of surfaces, Step height measurements in smaller trenches/holes than can be obtained with standard stylus method, roughness measurements with larger FOV than the AFM, but less horisontal resolution. | The main purpose is 3D topographic imaging of surfaces, Step height measurements in smaller trenches/holes than can be obtained with standard stylus method, roughness measurements with larger FOV than the AFM, but less horisontal resolution. | ||
===A rough overview of the performance of the Optical Profiler (Sensofar)=== | |||
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!style="background:silver; color:black;" align="left"|Purpose | |||
|style="background:LightGrey; color:black"|3D topographic imaging of surfaces.||style="background:WhiteSmoke; color:black"| | |||
*standard microscope imaging | |||
*confocal imaging | |||
*confocal profiling | |||
*PSI (Phase Shift Interferometry) | |||
*VSI (Vertical Scanning Interferometry) | |||
*high resolution thin film thickness measurement | |||
*Wafer mapping | |||
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!style="background:silver; color:black" align="left"|Performance | |||
|style="background:LightGrey; color:black"|Scan range xy||style="background:WhiteSmoke; color:black"| | |||
Line scan x: 50 µm to 100 mm | |||
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|style="background:silver; color:black"| | |||
|style="background:LightGrey; color:black"|Scan range z | |||
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50 Å to 1 mm | |||
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|style="background:LightGrey; color:black"|Resolution xy | |||
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down to 0.067 µm | |||
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|style="background:silver; color:black"| | |||
|style="background:LightGrey; color:black"|Resolution z | |||
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1Å, 10Å, 40Å or 160Å (for ranges 65kÅ, 655 kÅ, 2620 kÅ and 1mm respectively) | |||
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|style="background:silver; color:black"| | |||
|style="background:LightGrey; color:black"|Max. scan depth as a function of trench width W | |||
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1.2(W[µm]-5µm) | |||
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!style="background:silver; color:black" align="left"|Hardware settings | |||
|style="background:LightGrey; color:black"|Tip radius | |||
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*5 µm 45<sup>o</sup> cone | |||
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!style="background:silver; color:black" align="left"|Substrates | |||
|style="background:LightGrey; color:black"|Substrate size | |||
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*up to 8" | |||
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| style="background:LightGrey; color:black"|Substrate material allowed | |||
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*In principle all materials | |||
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==Comparing the profilers== | ==Comparing the profilers== | ||
Take a look at the [[Specific Process Knowledge/Characterization/Topographic measurement|topographic measurement]] page. | Take a look at the [[Specific Process Knowledge/Characterization/Topographic measurement|topographic measurement]] page. | ||