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Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch): Difference between revisions

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[[Image:AOE.jpg|300x300px|thumb|AOE: positioned in cleanroom 2]]
[[Image:AOE.jpg|300x300px|thumb|AOE: positioned in cleanroom 2]]


The AOE can be used for etching silicon oxide, silicon (oxy)nitride and quartz. Look in the manuals for the AOE to see how to operate the machine (you can find the manuals in LabManager on the [http://labmanager.danchip.dtu.dk/machine/machine_item.php?refpage=machlist&id=115 AOE page]).
The AOE can be used for etching silicon oxide, silicon (oxy)nitride and quartz. Look in the manuals for the AOE to see how to operate the machine (you can find the manuals in LabManager on the AOE page).


Currently all training on the AOE should be agreed with Berit Geilman Herstrøm. For training requests e-mail to [mailto:training@danchip.dtu.dk?Subject=AOE%20training training@danchip.dtu.dk]
Currently all training on the AOE should be agreed with Berit Geilman Herstrøm. For training requests e-mail to [mailto:training@danchip.dtu.dk?Subject=AOE%20training training@danchip.dtu.dk]
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