Specific Process Knowledge/Etch/Etching of Silicon Oxide: Difference between revisions
| Line 83: | Line 83: | ||
*E-beam resist | *E-beam resist | ||
*Aluminium | *Aluminium | ||
*Other metals that covers less the 5% of the wafer area (ONLY RIE2!) | *Other metals that covers less the 5% of the wafer area (ONLY RIE2!) | ||
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| Line 93: | Line 92: | ||
*E-beam resist | *E-beam resist | ||
*Aluminium | *Aluminium | ||
*Chromium | |||
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