Specific Process Knowledge/Etch/Etching of Polymer: Difference between revisions
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=== CYTOP etching: Results by Fei Wang, DTU Nanotech === | |||
Coil Power 600[W] | |||
Platen Power 150[W] | |||
Platen temperature 0[oC] | |||
Pressure 3mTorr | |||
O2 5sccm | |||
Ar 20sccm | |||
The etch rate is estimated as ~1.3um/min. | |||