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Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

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! Coil power (W)
! Coil power (W)
| 500
| 300
|-  
|-  
! Platen power (W)
! Platen power (W)
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! Etch rate (nm/min)
! Etch rate (nm/min)
| ~40
| ~14
|-  
|-  
!Zep520A resist selectivity
!Zep520A resist selectivity
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!Comment
!Comment
|This recipe is under development due to a high aspect ratio dependent etch rate for very narrow trenceds <100nm
| .|}
|}
 


=== Etching of nanostructures in silicon ===
=== Etching of nanostructures in silicon ===
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/ICP_Metal_Etcher"