Specific Process Knowledge/Characterization/XPS: Difference between revisions

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	The analysis is made on a chosen spot on the sample surface (choosen with the system camera). The technique is, as written above, very surface sensitive and probes only the top nanometers of the sample.		The analysis is made on a chosen spot on the sample surface (choosen with the system camera). The technique is, as written above, very surface sensitive and probes only the top nanometers of the sample.

	With the ion beam gun on the system a etch of the sample can be done. The system measures the desired ~~spectra~~, ~~do a~~ etch step and measures again. A series of etch cycles can be set up, measuring the composition of the sample at different depths (for example at different depth of a film).		With the ion beam gun on the system an etch of the sample can be done. The system measures the desired spectrum, does an etch step and measures again. A series of etch cycles can be set up, measuring the composition of the sample at different depths (for example at different depth of a film).