Specific Process Knowledge/Characterization/XPS: Difference between revisions

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 This gives an excellent tool for examining the chemistry of a surfaces, and how it is affected by different surface treatments.
-The figure to the left, showing an XPS Si2p spectrum of a Si reference sample and a Si sample that was treated in HF shortly before the measurement, gives a image of the effect. Two overlapping spectra shows the Si2p signal from two Si samples, and a clear difference between the untreated and HF treated sample is seen. The untreated spectrum has a clear feature at about ...eV due to Si atoms bonded to oxygen. In the spectrum from the HF treated sample, only the feature is present,
+The figure to the left gives an illustration of the effect. An XPS Si2p spectrum of a Si reference sample and a Si sample that was treated in HF shortly before the measurement, is clearly showing two differernt curves. The untreated spectrum has a clear feature at about 103 eV due to Si atoms bonded to oxygen. In the spectrum from the HF treated sample, only the feature steaming from Si-Si interaction is present. Note that both curves only shows the Si signal, but with an clear indication of the chemical state of the Si atoms in the samples.
 If you study polymers, you can detect the precense of different chemical groups, for example (C-C),(C-OH),(C=O),(CF3) or (CF2-CH2) in the polymeric layer. And after surface treatments, you may examine differences in the polymeric layer.
+Note that binding energies for different chemical states often can be found in the litterature.
 ===Depth profiling===