Specific Process Knowledge/Characterization/XPS: Difference between revisions
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==XPS technique== | ==XPS technique== | ||
[[ | [[Image:Stochiometry 20110510.JPG|450x450px|left|thumb|Stochiometry as a function of film depth (etch time). The relationship between Cr and Ni is quite stabel through the film. Measurements done with XPS-ThermoScientific ]] | ||
[[image:Si spectra Labadvisor.JPG| | [[image:Si spectra Labadvisor.JPG|450x450px|right|thumb|XPS Si2p spectrum of Si sample]] | ||
XPS is a surface sensitive and non destructive technique used for elemental composition analysis. | XPS is a surface sensitive and non destructive technique used for elemental composition analysis. | ||