Specific Process Knowledge/Characterization: Difference between revisions
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===[[/XPS|X-ray Photoelectron Spectroscopy (XPS)]]=== | ===[[/XPS|X-ray Photoelectron Spectroscopy (XPS)]]=== | ||
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Revision as of 08:14, 22 September 2011
Choose topic
- Sample imaging
- Topographic measurement
- Stress measurement
- Measurement of film thickness and optical constants
- Wafer thickness measurement
- Element analysis
- Hydrophobicity measurement
- Resistivity measurement
- Other electrical measurements
Choose equipment
SEM: Scanning Electron Microscopy