Specific Process Knowledge/Characterization: Difference between revisions
No edit summary |
|||
Line 45: | Line 45: | ||
===[[/Probe station|Probe station]]=== | ===[[/Probe station|Probe station]]=== | ||
===[[/XPS|X-ray Photoelectron Spectroscopy (XPS)]]=== |
Revision as of 08:08, 22 September 2011
Choose topic
- Sample imaging
- Topographic measurement
- Stress measurement
- Measurement of film thickness and optical constants
- Wafer thickness measurement
- Element analysis
- Hydrophobicity measurement
- Resistivity measurement
- Other electrical measurements
Choose equipment
SEM: Scanning Electron Microscopy