Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum: Difference between revisions

From LabAdviser
Newer edit →
VisualWikitext
Kn (talk | contribs)
danchip
979 edits
New page: Palladium can be deposited by e-beam evaporation. In the chart below you can compare the different deposition equipment. {| border="1" cellspacing="0" cellpadding="4" ! ! E-beam evapor...
 
Kn (talk | contribs)
danchip
979 edits
No edit summary
Line 1: Line 1:
Palladium can be deposited by e-beam evaporation. In the chart below you can compare the different deposition equipment.
Molybdenum can be deposited by e-beam evaporation. In the chart below you can compare the different deposition equipment.




Revision as of 09:34, 19 September 2011

Molybdenum can be deposited by e-beam evaporation. In the chart below you can compare the different deposition equipment.


E-beam evaporation (Alcatel)
Batch size
  • Up to 1x4" wafers
  • smaller pieces
Pre-clean RF Ar clean
Layer thickness 10Å to 1µm
Deposition rate 2Å/s to 15Å/s
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Molybdenum&oldid=5660"