Specific Process Knowledge/Lithography/Coaters/labspin05: Difference between revisions
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[[Image:Labspin_5.JPG|400px|thumb|Spin coater: LabSpin 05 is located in PolyFabLab in building 347]] | [[Image:Labspin_5.JPG|400px|thumb|Spin coater: LabSpin 05 is located in PolyFabLab in building 347]] | ||
Spin Coater: LabSpin 05 is a model LabSpin6 TT spin coater from SUSS. It's primary purpose is spin coating of SU-8 resist. It was installed in PolyFabLab in 2026. | Spin Coater: LabSpin 05 is a model LabSpin6 TT spin coater from SUSS. It's primary purpose is spin coating of SU-8 resist and EBR (Edge Bead Removal) of resist on round substrates. The EBR nozzle is either fixed for 4" or 6" wafers, depending on the user's request, as it needs manual adjustment. It was installed in PolyFabLab in 2026. | ||
The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=579 LabManager] - '''requires login''' | The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=579 LabManager] - '''requires login''' | ||