Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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*Wafers | *Wafers | ||
**100mm Si, SSP <100> | **100mm Si, SSP <100> | ||
* | *Resists | ||
**[[Specific_Process_Knowledge/Lithography/5214E|AZ 5214E]] (image reversal resist, but processed positive) | **[[Specific_Process_Knowledge/Lithography/5214E|AZ 5214E]] (image reversal resist, but processed positive) | ||
**[[Specific_Process_Knowledge/Lithography/MiR|AZ MiR 701]] (positive tone resist) | **[[Specific_Process_Knowledge/Lithography/MiR|AZ MiR 701]] (positive tone resist) | ||