Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions
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**100mm Si, SSP <100> | **100mm Si, SSP <100> | ||
*Resist | *Resist | ||
**[[Specific_Process_Knowledge/Lithography/5214E|AZ 5214E]] (image reversal, but processed positive) | **[[Specific_Process_Knowledge/Lithography/5214E|AZ 5214E]] (image reversal resist, but processed positive) | ||
**[[Specific_Process_Knowledge/Lithography/MiR|AZ MiR 701]] (positive) | **[[Specific_Process_Knowledge/Lithography/MiR|AZ MiR 701]] (positive tone resist) | ||
**[[Specific_Process_Knowledge/Lithography/nLOF|AZ nLOF 2020]] (negative) | **[[Specific_Process_Knowledge/Lithography/nLOF|AZ nLOF 2020]] (negative tone resist) | ||
*Spin coating (incl. HMDS) | *Spin coating (incl. HMDS) | ||
**[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]] | **[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]] | ||