Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/PECVD click here]''' <br> | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/PECVD click here]''' <br> | ||
[[Category:Equipment|Thin film PECVD]] | [[index.php?title=Category:Equipment|Thin film PECVD]] | ||
[[Category:Thin Film Deposition|PECVD]] | [[index.php?title=Category:Thin Film Deposition|PECVD]] | ||
==PECVD Plasma Enhanced Chemical Vapor Deposition== | ==PECVD Plasma Enhanced Chemical Vapor Deposition== | ||
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*NH<sub>3</sub>:0-1000 sccm | *NH<sub>3</sub>:0-1000 sccm | ||
*N<sub>2</sub>:0-3000 sccm | *N<sub>2</sub>:0-3000 sccm | ||
*5%PH<sub>3</sub>:0-60 sccm | *5%PH<sub>3</sub>:0-60 sccm | ||
*3%B<sub>2</sub>H<sub>6</sub>:0- | *3%B<sub>2</sub>H<sub>6</sub>:0-200 sccm | ||
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*SiH<sub>4</sub>:0-60 sccm | *SiH<sub>4</sub>:0-60 sccm | ||