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Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions

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! Parameter
! Parameter
! width="200" | Cr etch
|'''Cr etch'''
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! Cl<sub>2</sub> (sccm)
! Cl<sub>2</sub> (sccm)
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| ~0.9
| ~0.9
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!Comment
|This recipe is under development due to a high aspect ratio dependent etch rate for very narrow trenceds <100nm
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=== Etching of nanostructures in silicon ===
=== Etching of nanostructures in silicon ===
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