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Specific Process Knowledge/Lithography/Aligners/MAvsMLA: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,797 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,797 edits
Line 594: Line 594:
|Aligner: Maskless 01 (MLA1)
|Aligner: Maskless 01 (MLA1)
220mJ/cm<sup>2</sup>, Defoc -4
220mJ/cm<sup>2</sup>, Defoc -4
|[[Image:W06 MLA1 nLOF D220 F-4_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_03.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_03.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_04.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_2_04.jpg|400px]]


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